Recent Patents on Nanotechnology
Country
United Arab Emirates
Middle East
Subject Area and Category
Engineering
└
Engineering (miscellaneous)
Q2
└
Condensed Matter Physics
Q3
└
Materials Science (miscellaneous)
Q3
Publisher
SJR 2025
0.398
Q2
SJR Score
H-Index
41
Citations / Doc (2yr)
3.49
Total Docs. (latest)
59
Total Citations (3yr)
364
Publication type
Journals
ISSN
22124020, 18722105
Coverage
2007-2026
Journal Rank
#14,256
Subject Categories
Engineering (miscellaneous)
Q2
Condensed Matter Physics
Q3
Materials Science (miscellaneous)
Q3
Nanoscience and Nanotechnology
Q3
Subject Areas
Detailed Metrics
| Total Docs. (latest) | 59 |
| Total Docs. (3 years) | 95 |
| Total Refs. | 4,164 |
| Total Citations (3 years) | 364 |
| Citable Docs. (3 years) | 88 |
| Citations / Doc. (2 years) | 3.49 |
| Ref. / Doc. | 70.58 |
| % Female | 36.8% |
Metrics Visualization
Latest year data vs 3-year cumulative figures
Publication & Citation Trend
Loading trend data from Crossref...
Top 10 Most Cited Articles
Loading articles...
Frequently Asked Questions
What is the impact factor of Recent Patents on Nanotechnology?
The official Journal Impact Factor (JIF) is published by Clarivate in the Journal Citation Reports (JCR) and is not listed on this page. Based on SCImago data, Recent Patents on Nanotechnology has an SJR of 0.398 and is ranked Q2.
What is the SJR and quartile of Recent Patents on Nanotechnology?
Recent Patents on Nanotechnology has an SJR (SCImago Journal Rank) of 0.398 and its best quartile is Q2.
What is the H-index of Recent Patents on Nanotechnology?
The H-index of Recent Patents on Nanotechnology is 41, meaning 41 of its articles have each been cited at least 41 times.
Is Recent Patents on Nanotechnology indexed in Scopus?
Yes. Recent Patents on Nanotechnology is active in Scopus (Scopus Source List, August 2026).
Researcher Reviews
Write a ReviewNo reviews yet for this journal.
Be the first to share your experience!
Share Your Experience
Your review will be published after moderation. Email will not be displayed publicly.